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ORNL researchers have developed a deep learning-based approach to rapidly perform high-quality reconstructions from sparse X-ray computed tomography measurements.

We have been working to adapt background oriented schlieren (BOS) imaging to directly visualize building leakage, which is fast and easy.

The invention introduces a novel, customizable method to create, manipulate, and erase polar topological structures in ferroelectric materials using atomic force microscopy.

High coercive fields prevalent in wurtzite ferroelectrics present a significant challenge, as they hinder efficient polarization switching, which is essential for microelectronic applications.

Molecular Beam Epitaxy is a traditional technique for the synthesis of thin film materials used in the semiconducting and microelectronics industry. In its essence, the MBE technique heats crucibles filled with ultra-pure atomic elements under ultra high vacuum condition

This invention presents technologies for characterizing physical properties of a sample's surface by combining image processing with machine learning techniques.

Simurgh revolutionizes industrial CT imaging with AI, enhancing speed and accuracy in nondestructive testing for complex parts, reducing costs.

This invention introduces a system for microscopy called pan-sharpening, enabling the generation of images with both full-spatial and full-spectral resolution without needing to capture the entire dataset, significantly reducing data acquisition time.