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Researcher
- Kyle Kelley
- Rama K Vasudevan
- Singanallur Venkatakrishnan
- Amir K Ziabari
- Diana E Hun
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- Philip Boudreaux
- Ryan Dehoff
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- Maxim A Ziatdinov
- Michael Kirka
- Neus Domingo Marimon
- Nolan Hayes
- Obaid Rahman
- Olga S Ovchinnikova
- Ondrej Dyck
- Peter Wang
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- Rodney D Hunt
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- Saban Hus
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- Yongtao Liu

ORNL researchers have developed a deep learning-based approach to rapidly perform high-quality reconstructions from sparse X-ray computed tomography measurements.

A pressure burst feature has been designed and demonstrated for relieving potentially hazardous excess pressure within irradiation capsules used in the ORNL High Flux Isotope Reactor (HFIR).

We have been working to adapt background oriented schlieren (BOS) imaging to directly visualize building leakage, which is fast and easy.

The invention introduces a novel, customizable method to create, manipulate, and erase polar topological structures in ferroelectric materials using atomic force microscopy.

Sintering additives to improve densification and microstructure control of UN provides a facile approach to producing high quality nuclear fuels.

High coercive fields prevalent in wurtzite ferroelectrics present a significant challenge, as they hinder efficient polarization switching, which is essential for microelectronic applications.

Distortion in scanning tunneling microscope (STM) images is an unavoidable problem. This technology is an algorithm to identify and correct distorted wavefronts in atomic resolution STM images.

Moisture management accounts for over 40% of the energy used by buildings. As such development of energy efficient and resilient dehumidification technologies are critical to decarbonize the building energy sector.

This invention utilizes new techniques in machine learning to accelerate the training of ML-based communication receivers.

The use of Fluidized Bed Chemical Vapor Deposition to coat particles or fibers is inherently slow and capital intensive, as it requires constant modifications to the equipment to account for changes in the characteristics of the substrates to be coated.